Invention Application
- Patent Title: METHOD OF FORMING THIN FILM TRANSISTOR ARRAY SUBSTRATE
- Patent Title (中): 形成薄膜晶体管阵列基板的方法
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Application No.: US15274185Application Date: 2016-09-23
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Publication No.: US20170012092A1Publication Date: 2017-01-12
- Inventor: Kyoung Jin PARK , Ki Soub YANG , Seung Ryul CHOI , Kang Hyun KIM , Sam Jong LEE
- Applicant: LG DISPLAY CO., LTD.
- Applicant Address: KR Seoul
- Assignee: LG DISPLAY CO., LTD.
- Current Assignee: LG DISPLAY CO., LTD.
- Current Assignee Address: KR Seoul
- Priority: KR10-2014-0169057 20141128
- Main IPC: H01L27/32
- IPC: H01L27/32 ; H01L51/56

Abstract:
A method of forming an organic light emitting diode (OLED) display device is discussed. The method according to an embodiment includes forming a first bank pattern on a substrate and in an emission region and a non-emission region; forming a second bank pattern on the first bank pattern; forming an organic emission layer on the substrate in the emission region; and forming a planarization film on the substrate to include an opening under the first and second bank patterns in the non-emission region. The second bank pattern is on the first bank pattern in the non-emission region, and the first bank pattern is in the opening of the planarization film in the non-emission region.
Public/Granted literature
- US09825111B2 Method of forming thin film transistor array substrate Public/Granted day:2017-11-21
Information query
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