Invention Application
- Patent Title: TECHNIQUE FOR MEASURING OVERLAY BETWEEN LAYERS OF A MULTILAYER STRUCTURE
- Patent Title (中): 用于测量多层结构层之间的覆盖的技术
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Application No.: US14798283Application Date: 2015-07-13
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Publication No.: US20170018066A1Publication Date: 2017-01-19
- Inventor: Yakov WEINBERG , Ishai SCHWARZBAND , Roman KRIS , Itay ZAUER , Ran GOLDMAN , Olga NOVAK , Dhananjay Singh RATHORE , Ofer ADAN , Shimon LEVI
- Applicant: Applied Materials Israel Ltd.
- Main IPC: G06T7/00
- IPC: G06T7/00

Abstract:
A method for determining overlay between layers of a multilayer structure may include obtaining a given image representing the multilayer structure, obtaining expected images for layers of the multilayer structure, providing a combined expected image of the multilayer structure as a combination of the expected images of said layers, performing registration of the given image against the combined expected image, and providing segmentation of the given image, thereby producing a segmented image, and maps of the layers of said multilayered structure. The method may further include determining overlay between any two selected layers of the multilayer structure by processing the maps of the two selected layers together with the expected images of said two selected layers.
Public/Granted literature
- US09530199B1 Technique for measuring overlay between layers of a multilayer structure Public/Granted day:2016-12-27
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