Invention Application
US20170018420A1 METHOD FOR PROTECTING LAYER BY FORMING HYDROCARBON-BASED EXTEMELY THIN FILM
审中-公开
通过形成基于碳氢化合物的薄膜来保护层的方法
- Patent Title: METHOD FOR PROTECTING LAYER BY FORMING HYDROCARBON-BASED EXTEMELY THIN FILM
- Patent Title (中): 通过形成基于碳氢化合物的薄膜来保护层的方法
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Application No.: US15254724Application Date: 2016-09-01
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Publication No.: US20170018420A1Publication Date: 2017-01-19
- Inventor: Richika Kato , Ryu Nakano
- Applicant: ASM IP Holding B.V.
- Main IPC: H01L21/02
- IPC: H01L21/02

Abstract:
A method for protecting a layer includes: providing a substrate having a target layer; depositing a protective layer on the target layer, which protective layer contacts and covers the target layer and is constituted by a hydrocarbon-based layer; and depositing an oxide layer on the protective layer so that the protective layer in contact with the oxide layer is oxidized. The hydrocarbon-based layer is formed by plasma-enhanced atomic layer deposition (PEALD) using an alkylaminosilane precursor and a noble gas without a reactant.
Public/Granted literature
- US10043661B2 Method for protecting layer by forming hydrocarbon-based extremely thin film Public/Granted day:2018-08-07
Information query
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