Invention Application
- Patent Title: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
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Application No.: US15333044Application Date: 2016-10-24
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Publication No.: US20170045831A1Publication Date: 2017-02-16
- Inventor: Nicolaas Rudolf KEMPER , Henrikus Herman Marie COX , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Nicolaas TEN KATE , Martinus Hendrikus Antonius LEENDERS , Jeroen Johannes Sophia Maria MERTENS , Frits VAN DER MEULEN , Joost Jeroen OTTENS , Franciscus Johannes Herman Maria TEUNISSEN , Jan-Gerard Cornelis VAN DER TOORN , Martinus Cornelis Maria VERHAGEN , Marco POLIZZI , Edwin Augustinus Matheus VAN GOMPEL , Johannes Petrus Maria SMEULERS , Stefan Philip Christiaan BELFROID , Herman VOGEL
- Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
- Applicant Address: NL Veldhoven NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.,ASML HOLDING N.V.
- Current Assignee: ASML NETHERLANDS B.V.,ASML HOLDING N.V.
- Current Assignee Address: NL Veldhoven NL Veldhoven
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
Public/Granted literature
- US09904185B2 Lithographic apparatus and device manufacturing method Public/Granted day:2018-02-27
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