Invention Application
- Patent Title: SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Patent Title (中): 半导体器件及其制造方法
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Application No.: US15340387Application Date: 2016-11-01
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Publication No.: US20170047359A1Publication Date: 2017-02-16
- Inventor: Shunpei YAMAZAKI , Toru TAKAYAMA , Junya MARUYAMA , Yumiko OHNO
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Priority: JP2002-316397 20021030
- Main IPC: H01L27/12
- IPC: H01L27/12

Abstract:
It is an object of the present invention to provide a peeling method that causes no damage to a layer to be peeled and to allow not only a layer to be peeled with a small surface area but also a layer to be peeled with a large surface area to be peeled entirely. Further, it is also an object of the present invention to bond a layer to be peeled to various base materials to provide a lighter semiconductor device and a manufacturing method thereof. Particularly, it is an object to bond various elements typified by a TFT, (a thin film diode, a photoelectric conversion element comprising a PIN junction of silicon, or a silicon resistance element) to a flexible film to provide a lighter semiconductor device and a manufacturing method thereof.
Public/Granted literature
- US09929190B2 Semiconductor device and manufacturing method thereof Public/Granted day:2018-03-27
Information query
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