Invention Application
US20170053800A1 OXIDE FOR SEMICONDUCTOR LAYER OF THIN-FILM TRANSISTOR, SEMICONDUCTOR LAYER OF THIN-FILM TRANSISTOR HAVING SAID OXIDE, AND THIN-FILM TRANSISTOR
审中-公开
薄膜晶体管半导体层氧化物,具有氧化硅的薄膜晶体管的半导体层和薄膜晶体管
- Patent Title: OXIDE FOR SEMICONDUCTOR LAYER OF THIN-FILM TRANSISTOR, SEMICONDUCTOR LAYER OF THIN-FILM TRANSISTOR HAVING SAID OXIDE, AND THIN-FILM TRANSISTOR
- Patent Title (中): 薄膜晶体管半导体层氧化物,具有氧化硅的薄膜晶体管的半导体层和薄膜晶体管
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Application No.: US15290715Application Date: 2016-10-11
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Publication No.: US20170053800A1Publication Date: 2017-02-23
- Inventor: Hiroaki TAO , Aya MIKI , Shinya MORITA , Satoshi YASUNO , Toshihiro KUGIMIYA , Jae Woo PARK , Je Hun LEE , Byung Du AHN , Gun Hee KIM
- Applicant: KABUSHIKI KAISHA KOBE SEIKO SHO (Kobe Steel, Ltd.) , Samsung Display Co. , Ltd.
- Applicant Address: JP Kobe-shi KR Yongin-city
- Assignee: KABUSHIKI KAISHA KOBE SEIKO SHO (Kobe Steel, Ltd.),Samsung Display Co., Ltd.
- Current Assignee: KABUSHIKI KAISHA KOBE SEIKO SHO (Kobe Steel, Ltd.),Samsung Display Co., Ltd.
- Current Assignee Address: JP Kobe-shi KR Yongin-city
- Priority: JP2011-052179 20110309; JP2011-289740 20111228
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/477

Abstract:
The oxide of the present invention for thin-film transistors is an In—Zn—Sn-based oxide containing In, Zn, and Sn, wherein when the respective contents (atomic %) of metal elements contained in the In—Zn—Sn-based oxide are expressed by [Zn], [Sn], and [In], the In—Zn—Sn-based oxide fulfills the following expressions (2) and (4) when [In]/([In]+[Sn])≦0.5; or the following expressions (1), (3), and (4) when [In]/([In]+[Sn])>0.5. [In]/([In]+[Zn]+[Sn])≦0.3 - - - (1), [In]/([In]+[Zn]+[Sn])≦1.4×{[Zn]/([Zn]+[Sn])}−0.5 - - - (2), [Zn]/([In]+[Zn]+[Sn])≦0.83 - - - (3), and 0.1≦[In]/([In]+[Zn]+[Sn]) - - - (4). According to the present invention, oxide thin films for thin-film transistors can be obtained, which provide TFTs with excellent switching characteristics, and which have high sputtering rate in the sputtering and properly controlled etching rate in the wet etching.
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