Invention Application
- Patent Title: TECHNIQUES AND SYSTEMS FOR MODEL-BASED CRITICAL DIMENSION MEASUREMENTS
- Patent Title (中): 基于模型的关键尺寸测量的技术和系统
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Application No.: US15250649Application Date: 2016-08-29
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Publication No.: US20170069080A1Publication Date: 2017-03-09
- Inventor: Abdurrahman Sezginer , Eric Vella , Balaji Ganapathy , Yanwei Liu
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Main IPC: G06T7/00
- IPC: G06T7/00 ; G06T7/60

Abstract:
A reticle is inspected with an imaging system to obtain a measured image of a structure on the reticle, and the structure has an unknown critical dimension (CD). Using a model, a calculated image is generated using a design database that describes a pattern used to form the structure on the reticle. The model generates the calculated image based on: optical properties of reticle materials of the structure, a computational model of the imaging system, and an adjustable CD. A norm of a difference between the measured and calculated images is minimized by adjusting the adjustable CD and iteratively repeating the operation of generating a calculated image so as to obtain a final CD for the unknown CD of the structure. Minimizing the norm of the difference is performed simultaneously with respect to the adjustable CD and one or more uncertain parameters of the imaging system.
Public/Granted literature
- US09875534B2 Techniques and systems for model-based critical dimension measurements Public/Granted day:2018-01-23
Information query