Invention Application
- Patent Title: THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF FABRICATING THE SAME
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Application No.: US15357273Application Date: 2016-11-21
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Publication No.: US20170069761A1Publication Date: 2017-03-09
- Inventor: BONG-KYUN KIM , SEUNG-HO YOON , SHIN-IL CHOI
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Priority: KR10-2014-0094802 20140725
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L29/417 ; H01L29/66 ; H01L29/45 ; H01L21/441 ; H01L23/532 ; H01L27/12 ; H01L21/4763

Abstract:
A thin film transistor substrate includes a gate electrode disposed on a substrate; a semiconductor layer disposed on the substrate that partially overlaps the gate electrode and includes an oxide semiconductor material; and a source electrode and a drain electrode disposed on the semiconductor layer, where the drain electrode is spaced apart from the source electrode. The source electrode and the drain electrode each include a barrier layer and a main wiring layer, the a main wiring layer is disposed on the barrier layer, and the barrier layer includes a first metal layer disposed on the semiconductor layer, and a second metal layer disposed on the first metal layer.
Public/Granted literature
- US09871144B2 Thin film transistor substrate Public/Granted day:2018-01-16
Information query
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