Invention Application
US20170076942A1 Composition and Method for Making Picocrystalline Artificial Borane Atoms 有权
制造人造硼烷原子的组合物和方法

  • Patent Title: Composition and Method for Making Picocrystalline Artificial Borane Atoms
  • Patent Title (中): 制造人造硼烷原子的组合物和方法
  • Application No.: US15363230
    Application Date: 2016-11-29
  • Publication No.: US20170076942A1
    Publication Date: 2017-03-16
  • Inventor: Patrick Curran
  • Applicant: SemiNuclear, Inc.
  • Main IPC: H01L21/02
  • IPC: H01L21/02 C23C16/54 C23C16/46
Composition and Method for Making Picocrystalline Artificial Borane Atoms
Abstract:
Materials containing picocrystalline quantum dots that form artificial atoms are disclosed. The picocrystalline quantum dots (in the form of boron icosahedra with a nearly-symmetrical nuclear configuration) can replace corner silicon atoms in a structure that demonstrates both short range and long-range order as determined by x-ray diffraction of actual samples. A novel class of boron-rich compositions that self-assemble from boron, silicon, hydrogen and, optionally, oxygen is also disclosed. The preferred stoichiometric range for the compositions is (B12Hw)xSiyOz with 3≦w≦5, 2≦x≦4, 2≦y≦5 and 0≦z≦3. By varying oxygen content and the presence or absence of a significant impurity such as gold, unique electrical devices can be constructed that improve upon and are compatible with current semiconductor technology.
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