发明申请
- 专利标题： APPARATUS AND METHOD FOR ELECTROSTATIC SPRAYING OR ELECTROSTATIC COATING OF A THIN FILM
- 专利标题（中）： 静电喷雾或薄膜静电涂层的装置和方法
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申请号： US15362258申请日： 2016-11-28
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公开(公告)号： US20170077042A1公开(公告)日： 2017-03-16
- 发明人: Kazuhiko KOBAYASHI , Keisuke SUDA
- 申请人： Apic Yamada Corporation
- 申请人地址： JP Nagano
- 专利权人： Apic Yamada Corporation
- 当前专利权人： Apic Yamada Corporation
- 当前专利权人地址： JP Nagano
- 优先权： JP2012-262944 20121130; JP2012-269360 20121210; JP2012-271920 20121213; JP2013-027357 20130215; JPPCT/JP2013/006611 20131111
- 主分类号： H01L23/552
- IPC分类号： H01L23/552 ; H01L21/3205 ; H01L23/00 ; H01L21/326
摘要：
Provided is a resist film forming device which uses an electrostatic spray device which is capable of forming a thin film with a uniform thickness on a workpiece. A resist film forming device (100), which forms a resist film (108) on a substrate by electrostatic spraying, comprises: a nozzle (102) which, upon application of a prescribed voltage, sprays liquid particles which form the raw material for a resist film (108) toward a substrate (105) having stepped portions (105a); a driving means (111) for causing relative movement of the substrate (105) or the nozzle (102); and a control means (110) for controlling such that the resist film (108) is formed on the substrate (105) having the stepped portions (105a) by the liquid particles.
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