Invention Application
- Patent Title: APPARATUSES HAVING A FERROELECTRIC FIELD-EFFECT TRANSISTOR MEMORY ARRAY AND RELATED METHOD
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Application No.: US15379933Application Date: 2016-12-15
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Publication No.: US20170098660A1Publication Date: 2017-04-06
- Inventor: D.V. Nirmal Ramaswamy , Adam D. Johnson
- Applicant: Micron Technology, Inc.
- Main IPC: H01L27/11597
- IPC: H01L27/11597 ; G11C11/22

Abstract:
An apparatus comprises field-effect transistor (FET) structures stacked horizontally and vertically in a three-dimensional memory array architecture, gates extending vertically and spaced horizontally between the plurality of FET structures, and a ferroelectric material separating the FET structures and the gates. Individual ferroelectric FETs (FeFETs) are formed at intersections of the FET structures, the gates, and the ferroelectric material. Another apparatus comprises a plurality of bit lines and word lines. Each bit line has at least two sides that are coupled with a ferroelectric material such that each bit line is shared by neighboring gates to form a plurality of FeFETs. A method of operating a memory array comprises applying a combination of voltages to a plurality of word lines and digit lines for a desired operation for a plurality of FeFET memory cells, at least one digit line having the plurality of FeFET memory cells accessible by neighboring gates.
Public/Granted literature
- US09786684B2 Apparatuses having a ferroelectric field-effect transistor memory array and related method Public/Granted day:2017-10-10
Information query
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