Invention Application
- Patent Title: COMPOSITION FOR FORMING ORGANIC SEMICONDUCTOR FILM, ORGANIC SEMICONDUCTOR FILM AND METHOD FOR MANUFACTURING SAME, ORGANIC SEMICONDUCTOR ELEMENT AND METHOD FOR MANUFACTURING SAME, AND ORGANIC SEMICONDUCTOR COMPOUND
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Application No.: US15382745Application Date: 2016-12-19
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Publication No.: US20170098786A1Publication Date: 2017-04-06
- Inventor: Tetsu KITAMURA , Masashi KOYANAGI , Yuta SHIGENOI
- Applicant: FUJIFILM CORPORATION
- Priority: JP2014-177324 20140901
- Main IPC: H01L51/00
- IPC: H01L51/00 ; C09D5/24

Abstract:
Objects of the present invention are to provide a composition for forming an organic semiconductor film that has excellent preservation stability and makes the obtained organic semiconductor element exhibit excellent driving stability in the atmosphere, to provide an organic semiconductor film using the composition for forming an organic semiconductor film, a method for manufacturing the organic semiconductor film, an organic semiconductor element, a method for manufacturing the organic semiconductor element, and to provide a novel organic semiconductor compound.A composition for forming an organic semiconductor film of the present invention contains a specific organic semiconductor having an alkoxyalkyl group as a component A and a solvent as a component B, in which a content of a non-halogen-based solvent is equal to or greater than 50% by mass with respect to a total content of the component B, and a content of the component A is equal to or greater than 0.7% by mass and less than 15% by mass.
Information query
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