- 专利标题： SYSTEM AND METHOD FOR LITHOGRAPHIC SURFACE TEXTURING
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申请号： US15126214申请日： 2015-03-11
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公开(公告)号： US20170110330A1公开(公告)日： 2017-04-20
- 发明人: Jeayoung Choi , Christiana Honsberg
- 申请人： ARIZONA BOARD OF REGENTS ON BEHALF OF ARIZONA STATE UNIVERSITY
- 国际申请： PCT/US2015/019939 WO 20150311
- 主分类号： H01L21/308
- IPC分类号： H01L21/308 ; H01L21/3065 ; H01L21/306
摘要：
A method is provided for manufacturing an etched surface. The method includes the steps of assembling a plurality of particles on the surface of a substrate and etching the plurality of particles to vary the size and spacing of the particles on the surface of the substrate. The method further includes depositing a mask material on the substrate including the etched particles, removing the etched particles from the substrate, thereby exposing the substrate beneath the plurality of particles, and selectively etching the substrate exposed after removal of the plurality of particles.
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