Invention Application
- Patent Title: OPTICAL WAVEFRONT MEASURING DEVICE AND METHOD
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Application No.: US15298842Application Date: 2016-10-20
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Publication No.: US20170146427A1Publication Date: 2017-05-25
- Inventor: Jen Sheng LIANG
- Applicant: UMA Technology Inc.
- Priority: TW104138552 20151120
- Main IPC: G01M11/02
- IPC: G01M11/02 ; G02B27/30

Abstract:
In an optical wavefront measuring device, a SLM generates a plurality of different through holes, so that light beams pass through the through holes and form a plurality of light patterns. The distance between an infinite objective lens module and a test lens is adjusted so that the light patterns enter into a wavefront sensor in the form of approximately parallel light after passing through the infinite objective lens module and the test lens. The wavefront sensor captures a plurality of WS images which do not have a fold-over phenomenon according to the light patterns. Computer by using an algorithm to obtain wavefront change information, and then reconstructs a wavefront on the basis of the wavefront change information.
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