Invention Application
- Patent Title: COMPOSITION FOR FILM FORMATION, FILM, PRODUCTION METHOD OF PATTERNED SUBSTRATE, AND COMPOUND
-
Application No.: US14955473Application Date: 2015-12-01
-
Publication No.: US20170154782A1Publication Date: 2017-06-01
- Inventor: Shin-ya NAKAFUJI , Goji WAKAMATSU , Tsubasa ABE , Kazunori SAKAI
- Applicant: JSR Corporation
- Applicant Address: JP Minato-ku
- Assignee: JSR Corporation
- Current Assignee: JSR Corporation
- Current Assignee Address: JP Minato-ku
- Main IPC: H01L21/308
- IPC: H01L21/308 ; H01L21/027 ; H01L21/306 ; C08G65/40

Abstract:
A composition comprises a compound comprising a partial structure represented by formula (1) and comprising an intermolecular bond-forming group; and a solvent. X1 and X2 each independently represent a substituted or unsubstituted ring structure having 4 to 10 ring atoms constituted taken together with a spiro carbon atom and carbon atoms of an aromatic ring. R1 and R2 each independently represent a halogen atom, a hydroxy group, a nitro group or a monovalent organic group. a1 and a2 are each independently an integer of 0 to 8. n1 and n2 are each independently an integer of 0 to 2; k1 and k2 are each independently an integer of 0 to 8. A sum of k1 and k2 is no less than 1, and a sum of a1 and k1. A sum of a2 and k2 are no greater than 8.
Public/Granted literature
- US10053539B2 Composition for film formation, film, production method of patterned substrate, and compound Public/Granted day:2018-08-21
Information query
IPC分类: