- 专利标题: GAS SEPARATION MEMBRANE, METHOD OF PRODUCING GAS SEPARATION MEMBRANE, GAS SEPARATION MEMBRANE MODULE, AND GAS SEPARATOR
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申请号: US15458407申请日: 2017-03-14
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公开(公告)号: US20170182469A1公开(公告)日: 2017-06-29
- 发明人: Yusuke MOCHIZUKI , Makoto SAWADA , Takeshi NARITA , Shigehide ITOU , Hiroyuki NODA , Atsushi MUKAI
- 申请人: FUJIFILM Corporation
- 申请人地址: JP Tokyo
- 专利权人: FUJIFILM Corporation
- 当前专利权人: FUJIFILM Corporation
- 当前专利权人地址: JP Tokyo
- 优先权: JP2014-201930 20140930; JP2015-038734 20150227; JP2015-146305 20150724; JP2015-146306 20150724; JP2015-146307 20150724; JP2015-146308 20150724
- 主分类号: B01D71/70
- IPC分类号: B01D71/70 ; B01D71/64 ; B01D69/12 ; B01D53/22
摘要:
Provided are a gas separation membrane which has a resin layer containing a compound having a siloxane bond, in which the resin layer containing a compound having a siloxane bond satisfies Expressions 1 and 2, and at least one of gas permeability or gas separation selectivity is high under high pressure; a method of producing a gas separation membrane; a gas separation membrane module; and a gas separator. 0.9≧A/B≧0.55 Expression 1 B≧1.7 Expression 2 In the expressions, A represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms contained in the resin layer containing a compound having a siloxane bond at a depth of 10 nm from the surface of the resin layer containing a compound having a siloxane bond, and B represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms in the surface of the resin layer containing a compound having a siloxane bond.
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