The conductive film is configured such that in a case in which a parameter Ca of a first-overlapped-portion in which a thin metal wire constituting a first-electrode and a thin metal wire constituting a second-electrode are superimposed in plan view is represented by Equation (1) of Ca=(A−wa*wb)/d, while setting an area of the first-overlapped-portion to A (μm2), line widths of the respective thin metal wires constituting the first-electrode and the second-electrode to wa and wb (μm), and a distance between the first-electrode and the second-electrode in a thickness direction of a substrate to d (μm), in a 5 mm×5 mm quadrangular region that is set to include a crossing region in which the first-electrode and the second-electrode cross each other in a conductive region, the parameter Ca of 90% or more of the first-overlapped-portions included in the region is 1.0 or less.