ACTIVE DRYING STATION AND METHOD TO REMOVE IMMERSION LIQUID USING GAS FLOW SUPPLY WITH GAS OUTLET BETWEEN TWO GAS INLETS

Invention Application

US20170235236A1 ACTIVE DRYING STATION AND METHOD TO REMOVE IMMERSION LIQUID USING GAS FLOW SUPPLY WITH GAS OUTLET BETWEEN TWO GAS INLETS 审中-公开

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Patent Title: ACTIVE DRYING STATION AND METHOD TO REMOVE IMMERSION LIQUID USING GAS FLOW SUPPLY WITH GAS OUTLET BETWEEN TWO GAS INLETS
Application No.: US15481405

Application Date: 2017-04-06
Publication No.: US20170235236A1

Publication Date: 2017-08-17
Inventor: Bob STREEFKERK , Sjoerd Nicolaas Lambertus DONDERS , Erik Roelof LOOPSTRA , Johannes Catharinus Hubertus MULKENS
Applicant: ASML NETHERLANDS B.V.
Applicant Address: NL Veldhoven
Assignee: ASML NETHERLANDS B.V.
Current Assignee: ASML NETHERLANDS B.V.
Current Assignee Address: NL Veldhoven
Main IPC: G03F7/20
IPC: G03F7/20

ACTIVE DRYING STATION AND METHOD TO REMOVE IMMERSION LIQUID USING GAS FLOW SUPPLY WITH GAS OUTLET BETWEEN TWO GAS INLETS

Abstract:

A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively remove the liquid from the substrate W or other objects after immersion of all or part of a surface of the substrate W or other objects.

Public/Granted literature

US10761438B2 Active drying station and method to remove immersion liquid using gas flow supply with gas outlet between two gas inlets Public/Granted day:2020-09-01

Information query

Global Dossier Espacenet

IPC分类:

G	物理
G03	摄影术；电影术；利用了光波以外其他波的类似技术；电记录术；全息摄影术
G03F	图纹面的照相制版工艺，例如，印刷工艺、半导体器件的加工工艺；其所用材料；其所用原版；其所用专用设备（照相排版装置入B41B；为摄影用的感光材料或处理入G03C；电记录、感光层或处理入G03G）
G03F7/00	图纹面，例如，印刷表面的照相制版如光刻工艺；图纹面照相制版用的材料，如：含光致抗蚀剂的材料；图纹面照相制版的专用设备（用于特殊工艺的光致抗蚀剂结构见相关的位置，例如，B44C，H01L，例如，H01L21/00，H05K）
G03F7/20	.曝光及其设备（复制用照相印制设备入G03B27/00）