Invention Application
- Patent Title: Beam Homogenizer, Illumination System and Metrology System
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Application No.: US15439856Application Date: 2017-02-22
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Publication No.: US20170248794A1Publication Date: 2017-08-31
- Inventor: Markus Franciscus Antonius EURLINGS , Armand Eugene Albert Koolen , Teunis Willem Tukker , Johannes Matheus Marie De Wit , Stanislav Smirnov
- Applicant: ASML Netherlands B.V. , ASML Holding N.V.
- Applicant Address: NL Veldhoven NL Veldhoven
- Assignee: ASML Netherlands B.V.,ASML Holding N.V.
- Current Assignee: ASML Netherlands B.V.,ASML Holding N.V.
- Current Assignee Address: NL Veldhoven NL Veldhoven
- Main IPC: G02B27/09
- IPC: G02B27/09 ; G03F7/20 ; G01N21/49 ; G01B11/27 ; G01N21/88
Abstract:
A beam homogenizer for homogenizing a beam of radiation and an illumination system and metrology apparatus comprising such a beam homogenizer as provided. The beam homogenizer comprises a filter system having a controllable radial absorption profile and configured to output a filtered beam and an optical mixing element configured to homogenize the filtered beam. The filter system may be configured to homogenize the angular beam profile radially and said optical mixing element may be configured to homogenize the angular beam profile azimuthally.
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