Provided is an infrared reflective patterned product including: an infrared reflective pattern portion which includes an infrared reflective material in a region constituting at least a part of a support, in which the infrared reflective pattern portion has an uneven structure that includes a plurality of protruding portions and/or recessed portions, metal particles are contained on surfaces of the protruding portions and/or recessed portions of the uneven structure of the infrared reflective pattern portion, the metal particles include 60 number-percent or greater of tabular metal particles in a hexagonal shape or a circular shape, and the tabular metal particles which are plane-oriented so that an angle between a principal plane of the tabular metal particle and a surface of the uneven structure closest to the tabular metal particle is in a range of 0° to ±30° are adjusted to be 50 number-percent or greater of all tabular metal particles. In the infrared reflective patterned product, the ratio of the reflectance of the infrared reflective pattern portion at a wavelength with the highest reflectance in an infrared region of 780 nm to 2500 nm to the reflectance of a non-pattern portion is large in a case where the infrared reflective pattern portion is obliquely irradiated with infrared rays.