Invention Application
- Patent Title: SYSTEMS AND METHODS FOR MEASURING REFRACTIVE ERROR AND OPHTHALMIC LENSES PROVIDED THEREFROM
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Application No.: US15309862Application Date: 2014-11-20
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Publication No.: US20170265738A1Publication Date: 2017-09-21
- Inventor: Gabriel KEITA , Howard PURCELL
- Applicant: ESSILOR INTERNATIONAL (Compagnie Generale d'Optique)
- Applicant Address: FR Charenton-le-Pont
- Assignee: ESSILOR INTERNATIONAL (Compagnie Generale d'Optique)
- Current Assignee: ESSILOR INTERNATIONAL (Compagnie Generale d'Optique)
- Current Assignee Address: FR Charenton-le-Pont
- International Application: PCT/IB2014/003037 WO 20141120
- Main IPC: A61B3/028
- IPC: A61B3/028 ; G02C7/02 ; A61B3/103 ; A61B3/00 ; A61B3/10

Abstract:
Systems and methods for providing identification factors for an individual wearer. Some or all of the identification factors when within a predetermined value provide a prescription and corrective ophthalmic lenses for a selected individual wearer, the corrective ophthalmic lens having at least one correction that is to the nearest 0.20 diopter, or is in a range between about the nearest 0.01 diopter and about the nearest 0.20 diopter. The prescription and corrective ophthalmic lenses are obtained by at least first analysis performed with a first instrument, a second analysis performed with a second instrument, and a third analysis performed with a third instrument, in which each instrument is different, and each analysis is different.
Public/Granted literature
- US09980638B2 Systems and methods for measuring refractive error and ophthalmic lenses provided therefrom Public/Granted day:2018-05-29
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