- 专利标题: MICROELECTROMECHANICAL SYSTEMS (MEMS) STRUCTURE TO PREVENT STICTION AFTER A WET CLEANING PROCESS
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申请号: US15615238申请日: 2017-06-06
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公开(公告)号: US20170267516A1公开(公告)日: 2017-09-21
- 发明人: Chung-Yen Chou
- 申请人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 主分类号: B81B3/00
- IPC分类号: B81B3/00 ; B81C1/00
摘要:
A method for manufacturing a microelectromechanical systems (MEMS) structure with sacrificial supports to prevent stiction is provided. A first etch is performed into an upper surface of a carrier substrate to form a sacrificial support in a cavity. A thermal oxidation process is performed to oxidize the sacrificial support, and to form an oxide layer lining the upper surface and including the oxidized sacrificial support. A MEMS substrate is bonded to the carrier substrate over the carrier substrate and through the oxide layer. A second etch is performed into the MEMS substrate to form a movable mass overlying the cavity and supported by the oxidized sacrificial support. A third etch is performed into the oxide layer to laterally etch the oxidized sacrificial support and to remove the oxidized sacrificial support. A MEMS structure with anti-stiction bumps is also provided.
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