- 专利标题: Plasma Deposition Method For Catechol/Quinone Functionalised Layers
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申请号: US15515916申请日: 2015-08-24
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公开(公告)号: US20170297055A1公开(公告)日: 2017-10-19
- 发明人: Christophe Detrembleur , Cecile Vandeweerdt , Christelle Vreuls , Rodolphe Mauchauffe , Maryline Moreno-Couranjou , Nicolas Boscher , Patrick Choquet
- 申请人: Luxembourg Institute of Science and Technology (LIST)
- 优先权: EP14187218.4 20140930
- 国际申请: PCT/EP2015/069361 WO 20150824
- 主分类号: B05D1/00
- IPC分类号: B05D1/00 ; B05D5/00 ; C09D133/04 ; C09D133/26
摘要:
The invention provides a solvent-free plasma method for depositing an adherent catechol and/or quinone functionalised layer to an inorganic or organic substrate from a precursor which comprises at least a quinone group; a protected or unprotected catechol group; a molecule substituted by a quinone group and/or a protected or unprotected catechol group; and/or a natural or synthetic derivative of a catechol group and/or a quinone group; wherein the quinone group is a 1,2-benzoquinone group and the catechol group is a 1,2-dihydroxybenzene group.
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