Invention Application
- Patent Title: ULTRALOW EXPANSION TITANIA-SILICA GLASS
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Application No.: US15686313Application Date: 2017-08-25
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Publication No.: US20170349478A1Publication Date: 2017-12-07
- Inventor: Sezhian Annamalai , Carlos Alberto Duran , Kenneth Edward Hrdina , William Rogers Rosch
- Applicant: Corning Incorporated
- Main IPC: C03C3/076
- IPC: C03C3/076 ; C03B19/14 ; C03B25/00 ; C03C23/00 ; C03B19/12 ; C03C3/089 ; C03C3/112 ; C03C3/06 ; C03B25/02

Abstract:
Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.
Public/Granted literature
- US10329184B2 Ultralow expansion titania-silica glass Public/Granted day:2019-06-25
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