Invention Application
- Patent Title: GAS BARRIER FILM AND METHOD OF MANUFACTURING THE SAME
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Application No.: US15684312Application Date: 2017-08-23
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Publication No.: US20170350009A1Publication Date: 2017-12-07
- Inventor: Nao TAKASHIMA
- Applicant: TOPPAN PRINTING CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: TOPPAN PRINTING CO., LTD.
- Current Assignee: TOPPAN PRINTING CO., LTD.
- Current Assignee Address: JP Tokyo
- Priority: JP2015-036374 20150226
- Main IPC: C23C16/455
- IPC: C23C16/455 ; B05D1/00 ; B32B37/14 ; B29C71/02 ; B05D7/04 ; B32B27/08

Abstract:
A method of manufacturing a gas barrier film includes depositing an atomic layer deposition film on a surface of a plastic substrate to form a gas barrier laminate, using atomic layer deposition; depositing a curable resin layer on a support from which the layer is peelable, to form an overcoat laminate; laminating the overcoat laminate to the gas barrier laminate, with the atomic layer deposition film and the curable resin layer facing each other, and transferring the curable resin layer onto the atomic layer deposition film; curing the curable resin layer through application of heat or an active energy beam; and releasing the curable resin layer from the support.
Information query
IPC分类: