A method of designing a feminine hygiene applicator is disclosed. The method includes obtaining a first applicator; obtaining onset crystallization temperature for the first applicator; obtaining a second applicator; obtaining L*, a*, b* values for the second applicator; configuring a third applicator comprising an onset crystallization temperature which is within 3 percent of the onset crystallization temperature of the first applicator; configuring the third applicator to have an L* value within 20 percent of the L* value for the second applicator; configuring the third applicator to have an a* value within 20 percent of the a* value for the second applicator; and configuring the third applicator to have a b* value within 20 percent of the b* value for the second applicator.