Invention Application
- Patent Title: SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
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Application No.: US15498547Application Date: 2017-04-27
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Publication No.: US20180012901A1Publication Date: 2018-01-11
- Inventor: Shibun TSUDA
- Applicant: Renesas Electronics Corporation
- Priority: JP2016-135766 20160708
- Main IPC: H01L29/792
- IPC: H01L29/792 ; H01L27/088 ; H01L29/423 ; H01L29/78

Abstract:
An improvement is achieved in the reliability of a semiconductor device. In a memory cell region, a plurality of fins are provided which are portions of a semiconductor substrate extending in an x-direction along a main surface of the semiconductor substrate and spaced apart from each other in a y-direction orthogonal to the x-direction along the main surface of the semiconductor substrate. Between the fins adjacent to each other in the y-direction, a portion of an upper surface of an isolation region is at a position higher than a surface obtained by connecting a position of the upper surface of the isolation region which is in contact with a side wall of one of the fins to a position of the upper surface of the isolation region which is in contact with a side wall of the other fin. In a cross section along the y-direction, the upper surface of the isolation region has a projecting shape.
Public/Granted literature
- US09985043B2 Semiconductor device and method of manufacturing the same Public/Granted day:2018-05-29
Information query
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