Invention Application
- Patent Title: Probe System and Method
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Application No.: US15674920Application Date: 2017-08-11
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Publication No.: US20180045510A1Publication Date: 2018-02-15
- Inventor: Zirong Zahi , Kevin George Harding , Jie Han , Dongmin Yang , Clark Alexander Bendall , Jijun Gu
- Applicant: General Electric Company
- Priority: CN201610666159.6 20160812
- Main IPC: G01B11/25
- IPC: G01B11/25 ; G02B23/24 ; G01N21/954

Abstract:
A probe system and a method are provided. The probe system includes an emitter unit, a pattern generation system, and an intensity modulator. The emitter unit is for emitting light. The pattern generation system is for projecting at least one reference structured-light pattern onto an object surface to obtain at least one reference projected pattern, and including a mirror scanning unit for reflecting the light to a plurality of directions. The intensity modulator is for modulating intensity of the light according to the at least one reference projected pattern to provide modulated light to the mirror scanning unit to reflect the modulated light to the plurality of directions to project at least one modulated structured-light pattern onto the object surface to obtain at least one modulated projected pattern.
Public/Granted literature
- US11125551B2 Light modulation for inspection probes Public/Granted day:2021-09-21
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