Invention Application
- Patent Title: Symmetric VHF Source for a Plasma Reactor
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Application No.: US15793802Application Date: 2017-10-25
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Publication No.: US20180053630A1Publication Date: 2018-02-22
- Inventor: Kartik Ramaswamy , Igor Markovsky , Zhijang Chen , James D. Carducci , Kenneth S. Collins , Shahid Rauf , Nipun Misra , Leonid Dorf , Zheng John Ye
- Applicant: Applied Materials, Inc.
- Main IPC: H01J37/32
- IPC: H01J37/32
Abstract:
The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.
Public/Granted literature
- US11043361B2 Symmetric VHF source for a plasma reactor Public/Granted day:2021-06-22
Information query
