The present invention relates to a raw material for chemical deposition in a formula shown below and including an organoplatinum compound in which an alkenyl amine and an alkyl anion are coordinated to divalent platinum. In the formula, n is 1 or more and 5 or less. Each of substituents R1 to R5 on the alkenyl amine is a hydrogen atom, an alkyl group or the like and has a carbon number of 4 or less. Each of alkyl anions R6 and R7 is an alkyl group having a carbon number of 1 or more and 3 or less. The raw material has high vapor pressure enough to make possible the manufacturing of a platinum thin film at low temperature and also has moderate thermal stability.