• Patent Title: POLYAMIDE-IMIDE, RAW MATERIAL SALT OF POLYAMIDE-IMIDE, AND PRODUCTION METHOD THEREOF
  • Application No.: US15564678
    Application Date: 2016-04-06
  • Publication No.: US20180072848A1
    Publication Date: 2018-03-15
  • Inventor: Yumeto FUKUBAYASHIMakoto NAKAIAkira SHIGETAMunenori YAMADA
  • Applicant: UNITIKA LTD.
  • Applicant Address: JP Amagasaki-shi, Hyogo
  • Assignee: UNITIKA LTD.
  • Current Assignee: UNITIKA LTD.
  • Current Assignee Address: JP Amagasaki-shi, Hyogo
  • Priority: JP2015-078793 20150407; JP2015-078794 20150407
  • International Application: PCT/JP2016/061297 WO 20160406
  • Main IPC: C08G73/14
  • IPC: C08G73/14
POLYAMIDE-IMIDE, RAW MATERIAL SALT OF POLYAMIDE-IMIDE, AND PRODUCTION METHOD THEREOF
Abstract:
The present invention is to provide a polyamide-imide which has a high regularity of molecular structure and few branched structures, does not contain hydrogen halide, is not required to be separated and purified in post processes, and can be suitably used as a film, a varnish, or a molding material; raw material salt of polyamide-imide and production method thereof.The polyamide-imide has a repeating unit represented by the general formula (1): in which R1, R2 represent independently a divalent residue having an aromatic ring, an aliphatic ring or an aliphatic hydrocarbon; R3, R4 represent independently a trivalent residue having an aromatic ring or an aliphatic ring; and an hydrogen atom bonding to the respective rings may be replaced by another atom or an atomic group.
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