Invention Application
- Patent Title: PHOTORESIST AND ETCHING METHOD
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Application No.: US15678711Application Date: 2017-08-16
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Publication No.: US20180081276A1Publication Date: 2018-03-22
- Inventor: Shantao CHEN
- Applicant: BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Beijing
- Priority: CN201610843209.3 20160922
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/16 ; G03F7/004
Abstract:
The present disclosure discloses a photoresist including an ionizable substance capable of being ionized to generate ions under irradiation of UV light, and an etching method using the photoresist.
Information query
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