Invention Application
- Patent Title: GRAVURE CYLINDER AND MANUFACTURING METHOD THEREOF
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Application No.: US15559262Application Date: 2016-03-29
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Publication No.: US20180093467A1Publication Date: 2018-04-05
- Inventor: Shintaro SUGAWARA , Yoshinobu SATO
- Applicant: THINK LABORATORY CO., LTD.
- Applicant Address: JP Chiba
- Assignee: THINK LABORATORY CO., LTD.
- Current Assignee: THINK LABORATORY CO., LTD.
- Current Assignee Address: JP Chiba
- Priority: JP2015-082271 20150414
- International Application: PCT/JP2016/060135 WO 20160329
- Main IPC: B41F13/11
- IPC: B41F13/11 ; B41C1/18 ; B41F9/00 ; B41N1/06 ; B41N1/20

Abstract:
Provided are a gravure cylinder, which has satisfactory wear resistance as the gravure cylinder and includes a surface reinforcing coating layer having wear resistance equal to or more than that of chromium plating using hexavalent chromium, a method of manufacturing the gravure cylinder, and a method of manufacturing a printed matter using the gravure cylinder. The gravure cylinder includes: a plate base material; a recess layer, which is formed on a surface of the plate base material and includes a large number of recesses formed on the surface; and a surface reinforcing coating layer configured to cover the recess layer with chromium nitride or carbon nitride, in which the surface reinforcing coating layer is formed by reactive sputtering.
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