- 专利标题: GUIDING RESISTANT FORMING FABRIC WITH BALANCED TWILL MACHINE SIDE LAYER
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申请号: US15794410申请日: 2017-10-26
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公开(公告)号: US20180119352A1公开(公告)日: 2018-05-03
- 发明人: Derek Chaplin
- 申请人: AstenJohnson, Inc.
- 申请人地址: US SC Charleston
- 专利权人: AstenJohnson, Inc.
- 当前专利权人: AstenJohnson, Inc.
- 当前专利权人地址: US SC Charleston
- 主分类号: D21F7/08
- IPC分类号: D21F7/08 ; D03D13/00 ; D03D11/00
摘要:
A forming fabric for a papermaking machine woven according to a repeating fabric weave pattern is provided. The fabric includes a PS layer having a PS surface, with the PS layer including PS warps and PS wefts interwoven in a first repeating pattern, and a MS layer having a MS surface, with the MS layer including interwoven MS warps and MS wefts. A plurality of pairs of binder weft yarns is provided, with each of the pairs of binder weft yarns comprising first and second binder weft yarns that are interwoven according to a binder weft pattern with the PS warps and the MS warps to bind the PS and MS layers together in the composite forming fabric, and each interchanges between the layers at exchange points. In each pattern repeat of the fabric weave pattern, each of the MS warps forms one or more MS warp knuckles over single ones of the MS wefts, the MS warp knuckles of the MS warps are arranged in a broken twill having an offset mirror symmetric arrangement, and a direction of the broken twill reverses after an equal number of MS warp knuckles.
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