Invention Application
- Patent Title: INFRARED IMAGE SENSOR COMPONENT AND MANUFACTURING METHOD THEREOF
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Application No.: US15870940Application Date: 2018-01-13
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Publication No.: US20180138220A1Publication Date: 2018-05-17
- Inventor: Chien-Ying WU , Li-Hsin CHU , Chung-Chuan TSENG , Chia-Wei LIU
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Main IPC: H01L27/146
- IPC: H01L27/146

Abstract:
An infrared image sensor component includes a semiconductor substrate, an active pixel region disposed on the semiconductor substrate for receiving an infrared ray, and a transistor coupled to the active pixel region. The transistor includes a gate and a source/drain stressor disposed adjacent to the gate. The active pixel region includes a III-V compound material.
Public/Granted literature
- US10453881B2 Infrared image sensor component Public/Granted day:2019-10-22
Information query
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