Invention Application
- Patent Title: HIGH-CHI BLOCK COPOLYMERS FOR DIRECTED SELF-ASSEMBLY
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Application No.: US15841472Application Date: 2017-12-14
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Publication No.: US20180163003A1Publication Date: 2018-06-14
- Inventor: Daniel Sweat , Kui Xu
- Applicant: Brewer Science Inc.
- Main IPC: C08G81/02
- IPC: C08G81/02 ; C08F293/00 ; G03F7/16 ; G03F7/20 ; G03F7/32 ; C08L87/00 ; H01L21/027

Abstract:
The present invention is broadly concerned with novel directed self-assembly compositions, processes utilizing those compositions, and the resulting structures that are formed. The composition comprises a block copolymer of polystyrene and a polymethylmethacrylate block with polylactic acid side chains (“PS-b-P(MMA-LA)”). The block copolymer is capable of crosslinking and micro-phase separating into lines and spaces measuring about 10-nm or smaller with sub-20 nm L0 capability. Additionally, PS-b-P(MMA-LA) can be thermally annealed without a top-coat for simpler processing than the prior art. The polylactic acid side chains also increase the etch rate of the poly(methylmethacrylate) block when exposed to oxygen plasma, as well as lower the Tg.
Public/Granted literature
- US11078337B2 High-χ block copolymers for directed self-assembly Public/Granted day:2021-08-03
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