- 专利标题: Adjustment assembly and substrate exposure system comprising such an adjustment assembly
-
申请号: US15396032申请日: 2016-12-30
-
公开(公告)号: US20180188659A1公开(公告)日: 2018-07-05
- 发明人: Jerry Johannes Martinus PEIJSTER
- 申请人: Mapper Lithography IP B.V.
- 主分类号: G03F7/20
- IPC分类号: G03F7/20
摘要:
The invention relates to a substrate exposure system comprising a frame, a substrate support module for carrying a substrate, an exposure apparatus for exposing said substrate, and adjustment assembly for adjusting the position of the exposure apparatus with respect to the substrate support module. The adjustment assembly comprises a hydraulic actuator, a hydraulic generator and a conduit, wherein the conduit interconnects said hydraulic actuator and said hydraulic generator for forming a hydraulic system. The exposure apparatus, the frame, the adjustment assembly and the substrate support module are arranged as parts of a series of mechanically linked components. A first part of said series of mechanically linked components comprises the exposure apparatus, and a second part comprises the substrate support module. Said hydraulic actuator is arranged between said first part and said second part. Preferably the hydraulic actuator comprises a first bellows and the hydraulic generator comprises a second bellows.
公开/授权文献
信息查询
IPC分类: