Invention Application
- Patent Title: CARBON NANOTUBE FIELD-EFFECT TRANSISTOR WITH SIDEWALL-PROTECTED METAL CONTACTS
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Application No.: US15913164Application Date: 2018-03-06
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Publication No.: US20180198082A1Publication Date: 2018-07-12
- Inventor: Shu-Jen Han , Jianshi Tang
- Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Main IPC: H01L51/10
- IPC: H01L51/10 ; H01L51/05 ; H01L51/00

Abstract:
A field effect transistor includes a substrate and a gate dielectric formed on the substrate. A channel material is formed on the dielectric layer. The channel material includes carbon nanotubes. A patterned resist layer has openings formed therein. Metal contacts are formed on the channel material in the openings in the patterned resist layer and over portions of the patterned resist layer to protect sidewalls of the metal contacts to prevent degradation of the metal contacts.
Public/Granted literature
- US10381586B2 Carbon nanotube field-effect transistor with sidewall-protected metal contacts Public/Granted day:2019-08-13
Information query
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