- 专利标题： LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
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申请号： US15918575申请日： 2018-03-12
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公开(公告)号： US20180203364A1公开(公告)日： 2018-07-19
- 发明人: Bob STREEFKERK , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sofia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
- 申请人： Bob STREEFKERK , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sofia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
- 申请人地址： NL Veldhoven
- 专利权人： ASMLNETHERLANDS B.V.
- 当前专利权人： ASMLNETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 优先权： EP03257195.2 20031114; EP04254659.8 20040803
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
公开/授权文献
- US10345712B2 Lithographic apparatus and device manufacturing method 公开/授权日：2019-07-09
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