- 专利标题: Position Correction Method of Stage Mechanism and Charged Particle Beam Lithography Apparatus
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申请号: US15834351申请日: 2017-12-07
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公开(公告)号: US20180210353A1公开(公告)日: 2018-07-26
- 发明人: Rieko Nishimura , Hidekazu Takekoshi
- 申请人: NUFLARE TECHNOLOGY, INC.
- 申请人地址: JP Kanagawa
- 专利权人: NUFLARE TECHNOLOGY, INC.
- 当前专利权人: NUFLARE TECHNOLOGY, INC.
- 当前专利权人地址: JP Kanagawa
- 优先权: JP2017-012459 20170126
- 主分类号: G03F9/00
- IPC分类号: G03F9/00 ; G03F7/20
摘要:
According to one aspect of the present invention, a method of correcting a position of a stage mechanism, includes generating a two-dimensional map of a distortion amount at a position of a stage by applying a distortion amount of a position in a first direction of the stage at each of measured positions in a second direction as a distortion amount of a position in the first direction of the stage at each position in the second direction at each position in the first direction and by applying a distortion amount of a position in the second direction of the stage at each of measured positions in the first direction as a distortion amount of a position in the second direction of the stage at each position in the first direction at each position in the second direction; and correcting position data by using the two-dimensional map.
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