Invention Application
- Patent Title: MATERIAL CHARACTERIZATION FROM INFRARED RADIATION
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Application No.: US15443751Application Date: 2017-02-27
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Publication No.: US20180249095A1Publication Date: 2018-08-30
- Inventor: Chia-Hsun Lee , Haowei Liu , Amit Shahar
- Applicant: Intel Corporation
- Main IPC: H04N5/33
- IPC: H04N5/33 ; G06K9/62 ; G06T7/11

Abstract:
Systems, apparatuses, and/or methods to characterize a material. For example, and apparatus may include a pattern receiver to receive an IR pattern corresponding to non-uniform IR radiation that is to result from an interaction with a material, such as a translucent material. The apparatus may further include a characterizer to make a characterization of the material, such as a translucent material, based on the IR pattern. The characterization may differentiate the material, such as a translucent material, from one or more other materials, such as one or more other translucent materials.
Public/Granted literature
- US10354387B2 Material characterization from infrared radiation Public/Granted day:2019-07-16
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