Invention Application
- Patent Title: METHOD FOR PRODUCING PROTECTIVE-LAYER-COVERED GAS METHOD FOR PRODUCING PROTECTIVE-LAYER-COVERED GAS SEPARATION MEMBRANE, PROTECTIVE-LAYER-COVERED GAS SEPARATION MEMBRANE, GAS SEPARATION MEMBRANE MODULE, AND GAS SEPARATION APPARATUS
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Application No.: US15996533Application Date: 2018-06-04
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Publication No.: US20180272292A1Publication Date: 2018-09-27
- Inventor: Yusuke MOCHIZUKI , Satoshi YONEYAMA , Makoto SAWADA
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2015-241519 20151210
- Main IPC: B01D69/12
- IPC: B01D69/12 ; B01D71/70 ; B01D53/22 ; B01D67/00 ; C08J9/40 ; C08J9/36 ; C08J7/04 ; C09D183/06
Abstract:
A method for producing a protective-layer-covered gas separation membrane includes forming a gas separation membrane having a resin layer containing a compound having a siloxane bond and satisfying a particular condition by surface oxidation treatment of a resin layer precursor containing a siloxane bond; and providing a protective layer on the resin layer before winding. A protective-layer-covered gas separation membrane is produced by the method for producing a protective-layer-covered gas separation membrane. A gas separation membrane module and a gas separation apparatus are produced by the method for producing a protective-layer-covered gas separation membrane.
Information query
