- 专利标题: Memory Arrays And Methods Of Forming An Array Of Memory Cells
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申请号: US15987613申请日: 2018-05-23
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公开(公告)号: US20180277602A1公开(公告)日: 2018-09-27
- 发明人: Scott E. Sills , Durai Vishak Nirmal Ramaswamy
- 申请人: Micron Technology, Inc.
- 申请人地址: US ID Boise
- 专利权人: Micron Technology, Inc.
- 当前专利权人: Micron Technology, Inc.
- 当前专利权人地址: US ID Boise
- 主分类号: H01L27/24
- IPC分类号: H01L27/24 ; H01L45/00
摘要:
A method of forming an array of memory cells includes forming lines of covering material that are elevationally over and along lines of spaced sense line contacts. Longitudinal orientation of the lines of covering material is used in forming lines comprising programmable material and outer electrode material that are between and along the lines of covering material. The covering material is removed over the spaced sense line contacts and the spaced sense line contacts are exposed. Access lines are formed. Sense lines are formed that are electrically coupled to the spaced sense line contacts. The sense lines are angled relative to the lines of spaced sense line contacts and relative to the access lines. Other embodiments, including structure independent of method, are disclosed.
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