Invention Application
- Patent Title: FILTER, METHOD OF FORMATION THEREOF, AND IMAGE SENSOR
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Application No.: US15569384Application Date: 2016-05-04
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Publication No.: US20180299792A1Publication Date: 2018-10-18
- Inventor: Jelte Rients BEARDA , Joost André KLUGKIST , Robbert Jan VOOGD , Guido HERGENHAN , Meik PANITZ , Jochen TAUBERT
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP15170335.2 20150602
- International Application: PCT/EP2016/059957 WO 20160504
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02B5/20 ; F21V9/32 ; H04N5/225

Abstract:
A method of forming a radiation filter for a lithographic system, the method including forming at least one structure in or on a filter body, wherein the at least one structure provides a filtering effect and least one of a), b), c) or d): a) the at least one structure includes a plurality of transmissive, reflective, absorbing or fluorescent structures, and the method includes providing a desired distribution of the structures to provide a desired filtering effect; b) forming the at least one structure includes forming at least one transmissive, absorbing, reflective or fluorescent layer that has a variable thickness; c) forming the at least one structure includes altering at least one optical property to provide a variation of the optical property with position; d) the at least one structure includes a fluorescent layer that provides variation of at least one fluorescence property with position and/or angle of incidence.
Information query
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