- 专利标题: HIGH PURITY COBALT CHLORIDE AND MANUFACTURING METHOD THEREFOR
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申请号: US16027945申请日: 2018-07-05
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公开(公告)号: US20180312984A1公开(公告)日: 2018-11-01
- 发明人: Gaku Kanou
- 申请人: JX Nippon Mining & Metals Corporation
- 优先权: JP2013-249184 20131202
- 主分类号: C25B1/26
- IPC分类号: C25B1/26 ; C25B9/08 ; C25B11/04 ; C01G51/08
摘要:
A high purity cobalt chloride having a purity of 5N (99.999%) or higher and a manufacturing method of the high purity cobalt chloride via electrolysis are provided. In the method, cobalt having a purity of 5N or higher is used as an anode, a diluted hydrochloric acid bath having a pH of 1.5 to 3.0 is used as an electrolytic solution, the cobalt anode and a cathode plate are partitioned with an anion exchange membrane, and electrodeposition of the cobalt onto the cathode plate is thereby inhibited. The manufacturing method is capable of providing high purity cobalt chloride at a higher purity and at a lower production cost than conventional methods. Under circumstances where demands for cobalt chloride may increase, cobalt chloride needs to be manufactured at high volume and at low cost, and the method disclosed herein provides a technique capable of satisfying the foregoing requirements.
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