发明申请
- 专利标题: OFFSET PRINTING PLATE, OFFSET PRINTING APPARATUS, AND OFFSET PRINTING METHOD
-
申请号: US15773322申请日: 2016-10-12
-
公开(公告)号: US20180319194A1公开(公告)日: 2018-11-08
- 发明人: Tatsuo SHIGETA
- 申请人: THINK LABORATORY CO., LTD.
- 优先权: JP2015-218469 20151106
- 国际申请: PCT/JP2016/080209 WO 20161012
- 主分类号: B41N1/22
- IPC分类号: B41N1/22 ; G03F7/11 ; B32B1/08 ; B32B27/08 ; B41N1/00
摘要:
Provided are an offset printing plate, an offset printing apparatus, and an offset printing method, which are capable of printing a high-definition image by waterless offset printing.The offset printing plate comprises: a cylindrical plate base material; a silicon resin layer formed on the cylindrical plate base material; and a resist pattern part formed on the silicon resin layer, in which the silicon resin layer serves as a non-printing area, and the resist pattern part serves as a printing area. The silicon resin layer is preferably formed on the cylindrical plate base material seamlessly.
信息查询