发明申请
- 专利标题: PARTICLE THERAPY SYSTEM
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申请号: US15963281申请日: 2018-04-26
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公开(公告)号: US20180326226A1公开(公告)日: 2018-11-15
- 发明人: Fuutarou EBINA , Takamichi AOKI
- 申请人: Hitachi, Ltd.
- 优先权: JP2017-095157 20170512
- 主分类号: A61N5/10
- IPC分类号: A61N5/10 ; H05H13/04 ; H05H7/00 ; H05H7/04
摘要:
[Problem]A particle therapy system capable of reducing the installation area and also suppressing a variation in the irradiation beam position is provided. A synchrotron generates a charged particle beam, and a beam delivery system irradiates an irradiation target with a charged particle beam extracted from the synchrotron thereby forming a radiation field. A rotating gantry is provided with the beam delivery system and is rotatable around the irradiation target. Dispersion measuring devices, each of which measures the dispersion of the charged particle beam at the position of the irradiation target at a plurality of rotation angles of the rotating gantry, are also provided. The orbit center of the charged particle beam extracted from the synchrotron and the rotation axis of the rotating gantry are located on substantially the same straight line.
公开/授权文献
- US10456602B2 Particle therapy system 公开/授权日:2019-10-29