• Patent Title: SEMICONDUCTOR LASER WITH TENSILE STRAINED InAlAs ELECTRON BLOCKER FOR 1310 NANOMETER HIGH TEMPERATURE OPERATION
  • Application No.: US15627291
    Application Date: 2017-06-19
  • Publication No.: US20180366914A1
    Publication Date: 2018-12-20
  • Inventor: Pierre Doussiere
  • Applicant: Intel Corporation
  • Main IPC: H01S5/343
  • IPC: H01S5/343 H01S5/20 H01S5/34
SEMICONDUCTOR LASER WITH TENSILE STRAINED InAlAs ELECTRON BLOCKER FOR 1310 NANOMETER HIGH TEMPERATURE OPERATION
Abstract:
Embodiments may relate to a multiple quantum well (MQW) laser for operating at high temperatures, comprising at least one quantum well made of compressively strained InGaAlAs layers that are alternatively stacked with tensile strained InGaAlAs layers, the at least one quantum well surrounded on one side by a n-doped InP cladding and on the other by a p-doped InP cladding so as to form a double hetero-junction. A confinement layer of lattice-matched InAlAs may be provided between the quantum well and the p-doped cladding, having a first surface facing or adjacent to the quantum well and a second surface facing or adjacent to the p-doped cladding. An additional electron containment layer of tensile strained InAlAs may be provided facing or adjacent to one surface of the confinement layer, having a thickness smaller than that of the confinement layer. Other embodiments may be described and/or claimed.
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