发明申请
- 专利标题: RF FILTER TUNING SYSTEM AND METHOD FOR MANUFACTURING FILTER USING THE SAME
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申请号: US16142636申请日: 2018-09-26
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公开(公告)号: US20190027798A1公开(公告)日: 2019-01-24
- 发明人: Nam-Shin Park , Joung-Hoe Kim , Don-Yong Lee , Kang-Hui Suh , Jong-Youn Jung , Sang-Hwan Cho , Dong-Cheon Kim , Sang-Yoong Kim , Yong-Jin Park , Oh-Kwon Kim
- 申请人: KMW INC.
- 专利权人: KMW INC.
- 当前专利权人: KMW INC.
- 优先权: KR10-2015-0139895 20151005
- 主分类号: H01P1/208
- IPC分类号: H01P1/208 ; H01P1/205
摘要:
An automatic RF filter tuning system and a method for manufacturing a filter using the same are disclosed. An RF filter tuning system for tuning an RF filter that includes a plurality of cavities having resonance elements and a cover having tuning areas that are positioned correspondingly to the resonance elements, includes a measuring unit configured to measure resonance characteristics of the cavity of the RF filter, a control unit configured to calculate a tuning value of the RF filter based on the resonance characteristics, and a tuning unit configured to tune the RF filter based on the tuning value calculated by the control unit. The tuning unit includes a striking unit configured to strike the tuning area of the cover of the RF filter, thereby adjusting the resonance value and tuning the RF filter.
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