Invention Application
- Patent Title: METHOD FOR PRODUCING METAL WIRING-CONTAINING LAMINATE, METAL WIRING-CONTAINING LAMINATE, AND SUBSTRATE WITH PLATED LAYER
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Application No.: US16131121Application Date: 2018-09-14
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Publication No.: US20190029111A1Publication Date: 2019-01-24
- Inventor: Chika MATSUOKA , Takahiko ICHIKI , Takehiro KASAHARA , Takeshi NARITA
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2016-068253 20160330
- Main IPC: H05K1/02
- IPC: H05K1/02 ; H05K3/18 ; H05K3/46 ; B32B15/01

Abstract:
The present invention provides a method for producing a metal wiring-containing laminate which is capable of efficiently producing a metal wiring-containing laminate having a fine metal wiring with low resistance; as well as a metal wiring-containing laminate and a substrate with a plated layer. The method for producing a metal wiring-containing laminate of the present invention includes: a step of forming a photosensitive layer having a functional group capable of interacting with a plating catalyst or a precursor thereof on a substrate; a step of exposing the photosensitive layer in a patternwise manner and subjecting the exposed photosensitive layer to a development treatment to form a plated layer having a groove portion; a step of applying a plating catalyst or a precursor thereof to the plated layer; and a step of subjecting the plated layer, to which the plating catalyst or the precursor thereof has been applied, to a plating treatment to form a metal wiring so as to fill the groove portion.
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